年度 2011
論文名稱 Chih-Hong Hwang and Yiming Li, “Modeling of Work-Function Fluctuation for 16 nm FinFET Devices with TiN/HfSiON Gate Stack,” Proceedings of Technical Program, 2010 International Symposium on VLSI Technology, Systems, and Applications (2010 VLSI-TSA), Hsinchu, Taiwan, Apr. 26-28, 2010, pp. 74-75.
發表日期 2011-08-01