年度 2011
論文名稱 Hui-Wen Cheng and Yiming Li, “Random Work Function Variation Induced Threshold Voltage Fluctuation in 16-nm Bulk FinFET Devices with High-k-Metal-Gate Material,” Proceedings of The 14th IEEE International Workshop on Computational Electronics (IEEE IWCE 2010), Pisa, Italy, Oct. 27-29, 2010, pp.331-334.
發表日期 2011-08-01