年度 2011
論文名稱 Ming-Hung Han, Chih-Hong Hwang, and Yiming Li, “Metal-Gate Workfunction Fluctuation (WKF), Process Variation Effect (PVE) and Random Dopant Fluctuation (RDF) in 16 nm CMOS Device and Analog Circuit,” Proceedings of The 2009 International Electron Devices and Materials Symposia (IEDMS 2009),Chang Gung University, Kweishan, Taiwan, Nov. 19-20, 2009, pp. 733-734.
發表日期 2011-08-01