年度 2011
論文名稱 Yiming Li, Chih-Hong Hwang, Shao-Ming Yu, Hui-Wen Cheng, Hsuan-Ming Huang, and Ta-ChingYeh, “Process-Variation- and Random-Dopant-Induced Threshold Voltage Fluctuations in Nanometer Scale Planar MOSFET and Bulk FinFET Devices,” Accepted by The 4th International Symposium on Advanced Gate Stack Technology (IEEE ISAGST 2007), Westin City Center Hotel, Dallas, Texas, September 26-28, 2007.
發表日期 2011-08-01