年度 2010
论文名称
H. Watanabe, D. Matsushita, K. Muraoka, “Determination of tunnel mass and physical thickness of gate oxide including poly-Si/SiO2 and Si/SiO2 interfacial transition layers”, IEEE Trans. Elec. Dev. Vol. 53, no. 6, pp. 1323-1330, 2006.
发表日期 2010-06-08